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History

History of Sumitomo GaAs Epiwafer Business

1971 Organometallics R&D start
1981 MOCVD Research start high electron mobility GaAs (163,000cm2/Vs@77K)
1984 Epitronics founded
1989 AlGaAs/InGaAs p-HEMT R&D
1991 O2-doped AlGaAs buffer FET Technology (Tsukuba Laboratory)
1992 Development of MOCVD system for GaAs Production
  GaN LED R&D start
  InGaP HBT R&D (Epitronics)
1995 AlGaAs HBT R&D
  High Brightness LED R&D, 1cd GaN epiwafer
  Development of MOCVD system for GaN Production
  ATMI acquires Epitronics
1998 p-HEMT & HB-LED Production start
  InGaP-HBT Production start
2001 ATMI expands into Airport facility
2003 Acquired the assets of ATMI GaAs Epitaxy Division
2004 Sumika receives ISO9001:2000 certification
  Veeco equipment acquisition
2005 Sumika expands p-HEMT epiwafer production
2007 Additional reactors installed (1 Aixtron 2600G3 and 1 Veeco E450)
2008 Sumika receives ISO14001:2004 certification
2009 Additional reactor installed, Aixtron 2600G3
2010 Sumika receives Quality Assurance Certificate from Panasonic Corporation

*bold type indicates within the U.S.