Drawing on the broad expertise we have accumulated over many years as a diversified chemical company, we continue to expand our line of SUMIRESIST positive-type photoresists. As one of the leading photoresist suppliers in the world, our product portfolio covers a wide range of technologies and applications. In anticipation of ever growing and diversifying customer needs we continuously increase and focus our development efforts on more advanced resist platforms, including those for next generation lithography technologies.

i-line:	PFi Series resists for all critical and non-critical applications.
KrF:	PEK Series resists for all critical and non-critical applications.
ArF:	PAR Series resists (both dry and immersion applications) for your most demanding applications.
E-Beam:	NEB Series Resists (negative tone) for all photomask and other direct write applications.
EUV:	We are developing EUV products for the <22nm requirements.
Process Chemicals:	Standard and custom solvents and CMP rinses.

Metal Sputtering Targets

Sumitomo Chemical uses our proprietary crystal control technology to manufacture aluminum alloy targets and titanium targets of superior quality and reliability.

These targets are then used by our customers worldwide for manufacturing electrodes and the electrical wiring for advanced integrated circuits.